Euv pellicle with structured ventilation frame

A reticle structure, comprising:

• a reticle having patterned features and a first border section enclosing the patterned features;
• a membrane having a middle section a second border section enclosing the middle section;
• and
• a frame disposed between the membrane and the reticle and configured to mount the membrane over the patterned features of the reticle, wherein the frame creates an enclosure between the reticle and the membrane and encircles the patterned features of the reticle, wherein the frame comprises a plurality of holes, and wherein the plurality of holes produces a threshold percentage of opening in the frame to maintain an equalized pressure difference between the enclosure and outside the enclosure below a threshold pressure.

A method, comprising:

• mounting a membrane over a frame, wherein the membrane comprises a middle section and a border section enclosing the middle section;
• connecting the frame comprising a plurality of holes from a first side, with a first adhesive layer, to the border section of the membrane, wherein the frame encircle the middle section of the membrane, and wherein the middle section of the membrane is transparent to DUV or EUV radiation;
• connecting a second adhesive layer to a second side of the frame opposite the first side of the frame, wherein the frame is configured to be attached, via the second adhesive layer, to a reticle to generate an enclosure between the membrane, the reticle, and the frame;
• and
• providing, by the plurality of holes, a threshold percentage of opening in the frame, wherein the threshold percentage of opening maintains an equalized pressure difference, below a threshold pressure, between a volume inside the enclosure and outside the enclosure.