Loading patent…
AssigneeASML Netherlands B.V.
InventorsDennis DE GRAAF, Richard BEAUDRY, Maxime BIRON, Paul JANSSEN, Thijs KATER, Kevin KORNELSEN, Michael Alfred Josephus KUIJKEN, Jan Hendrik Willem KUNTZEL, Stephane MARTEL, Maxim Aleksandrovich NASALEVICH, Guido SALMASO, Pieter-Jan VAN ZWOL
Estimating the term…
A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.
An assembly, comprising a wafer, a mask provided on one face of the wafer, and at least one layer provided on an opposite face of the wafer to the one face, wherein the mask comprises at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer.
-5. (canceled)
(canceled)
A method of preparing a pellicle, the method comprising:
(canceled)
(canceled)
-20. (canceled)
A method of preparing a pellicle, the method comprising:
-25. (canceled)
(canceled)
A pellicle for a lithographic apparatus, the pellicle comprising a silicon core and one or more capping layers, wherein the pellicle is substantially devoid of an oxide layer between the silicon core and the one or more capping layers.
(canceled)
A pellicle for a lithographic apparatus, the pellicle comprising at least one metal nitride layer and a metallic capping layer disposed on the at least one metal nitride layer.
(canceled)
Dependencies are inferred from the claim text.