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US 2021/0200101 A1Published application
Projection exposure apparatus for semiconductor lithography including a magnetic damping arrangement
AssigneeCarl Zeiss SMT GmbH
InventorPhilipp Meinkuss
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Abstract
A projection exposure apparatus for semiconductor lithography includes at least one component which is provided with a damping arrangement for dissipating mechanical vibration energy. The damping arrangement includes a ferromagnetic element, through which a magnetic field passes at least partly. The magnetic flux density is inhomogeneous at least regionally. The ferromagnetic element is mounted in such a way that it is movable with a movement component in the direction of the inhomogeneity of the magnetic field.
Claims20
An apparatus, comprising:
- a component comprising a damping arrangement configured to dissipate mechanical vibration energy,
- wherein:
- the damping arrangement comprises a ferromagnetic element and a first structured soft-magnetic element;
- the component is configured so that, when the component is exposed to a magnetic field, the first structured soft-magnetic component produces an at least regional inhomogeneity in a flux density of the magnetic field, and the ferromagnetic element is moveable in a direction of the inhomogeneity in the flux density of the magnetic field;
- and
- the apparatus is a semiconductor lithography projection exposure apparatus.
3 more elements
Dependencies are inferred from the claim text.