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US 2021/0063887 A1Published application
Euv developer composition for forming photosensitive photoresist micropattern
AssigneeYoung Chang Chemical Co., Ltd
InventorsSu Jin LEE, Gi Hong KIM, Seung Hun LEE, Seung Hyun LEE
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Abstract
An extreme ultraviolet (EUV) developer composition for use in manufacturing a semiconductor is provided. More particularly an EUV developer composition for forming a fine pattern is provided, which is capable of forming a more uniform pattern and lowering EOP in a development process, the EUV developer composition including a water-soluble polymer represented by Chemical Formula 1, a nonionic surfactant represented by Chemical Formula 2, and an alkali compound.
Claims9
A developer composition for forming a fine pattern, comprising:
- a water-soluble polymer represented by Chemical Formula 1 below;
- a nonionic surfactant represented by Chemical Formula 2 below;
- and
- an alkali compound:
- in Chemical Formula 1, n is an integer selected from among 10 to 50;
- and
- in Chemical Formula 2, m is an integer selected from among 10 to 40.
4 more elements
Dependencies are inferred from the claim text.