Pattern-forming method and radiation-sensitive composition

Abstract

An object of the present invention is to provide a pattern-forming method and a radiation-sensitive composition being superior in each of sensitivity and a scum-inhibiting property. According to an aspect of the invention, a pattern-forming method includes applying directly or indirectly on a substrate a radiation-sensitive composition; exposing to an extreme ultraviolet ray or an electron beam a film formed after the applying; and developing the film exposed, wherein the radiation-sensitive composition contains: particles having a metal oxide as a principal component; a radical trapping agent; and an organic solvent. Furthermore, another aspect of the present invention is a radiation-sensitive composition containing: particles having a metal oxide as a principal component; a radical trapping agent; and an organic solvent.

Dependencies are inferred from the claim text.