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US 2020/0401057 A1Published application
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsMartinus Hendrikus Antonius LEENDERS, Nicolaas Rudolf Kemper, Joost Jeroen Ottens
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Abstract
An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
Claims20
A lithographic apparatus, comprising:
- a projection system;
- a table configured to hold a substrate to be imaged by the projection system;
- and
- a liquid supply system configured to provide a space between the projection system and the substrate with liquid, at least a part of the liquid supply system being moveable relative to and independent of the projection system and the substrate in at least one direction which is substantially parallel to a top surface of the substrate.
1 more element
A lithographic apparatus, comprising:
- a projection system;
- a table configured to hold a substrate to be imaged by the projection system;
- and
- a liquid supply system comprising a barrier member, surrounding the projection system, configured to at least partly contain liquid in a volume including a space between the projection system and the substrate,
- wherein the barrier member is configured to be moveable independently of the substrate in a first direction in a plane substantially parallel to a top surface of the substrate, and
- wherein the barrier member is sized and shaped such that it is moveable in the first direction by at least a distance equal to a slit height of the lithographic apparatus.
3 more elements
Dependencies are inferred from the claim text.