Exposure method, exposure apparatus, method of manufacturing article, and measurement method

An exposure apparatus that exposes a substrate while moving an original and the substrate in a scanning direction, comprising:

• a measurement unit configured to cause a light beam obliquely enter each of a plurality of measurement points on the substrate and obtain a measurement value of a position in a height direction of the substrate of each measurement point;
• and
• a control unit configured to control a process of exposing the substrate,
• wherein the control unit
• positions the substrate at each of a plurality of positions in the height direction of the substrate and obtains, for each of the plurality of positions, a first measurement value of the position in the height direction of each of a plurality of measurement points on the substrate by causing the measurement unit to measure the plurality of measurement points on the substrate while moving the substrate in the scanning direction,
• specifies, based on the first measurement value of each measurement point at each of the obtained plurality of positions, a position of a concave-convex portion present in the substrate by obtaining a surface shape of the substrate, and
• drives the substrate, based on the specified position of the concave-convex portion and a second measurement value of the position in the height direction of each measurement point obtained by causing the measurement unit to measure the plurality of measurement points while moving the substrate in the scanning direction, so that the position in the height direction of the substrate will be a target position, when exposing the substrate.

A method of manufacturing an article, comprising:

• exposing a substrate by using an exposure apparatus;
• developing the exposed substrate;
• and
• manufacturing the article from the developed substrate,
• wherein the exposure apparatus is an exposure apparatus that exposes the substrate while moving an original and the substrate in a scanning direction, including
• a measurement unit configured to cause a light beam obliquely enter each of a plurality of measurement points on the substrate and obtain a measurement value of a position in a height direction of the substrate of each measurement point, and
• a control unit configured to control a process of exposing the substrate, and
• the control unit
• positions the substrate at each of a plurality of positions in the height direction of the substrate and obtains, for each of the plurality of positions, a first measurement value of the position in the height direction of each of a plurality of measurement points on the substrate by causing the measurement unit to measure the plurality of measurement points on the substrate while moving the substrate in the scanning direction,
• specifies, based on the first measurement value of each measurement point at each of the obtained plurality of positions, a position of a concave-convex portion present in the substrate by obtaining a surface shape of the substrate, and
• drives the substrate, based on the specified position of the concave-convex portion and a second measurement value of the position in the height direction of each measurement point obtained by causing the measurement unit to measure the plurality of measurement points while moving the substrate in the scanning direction, so that the position in the height direction of the substrate will be a target position, when exposing the substrate.