System and Method for Improved Chemical Etching

Abstract

A chemical etching apparatus and methods of using are disclosed. An apparatus used for chemical etching includes a bath designed to hold a first liquid. A liquid supply pipe runs along a bottom portion of the bath. The liquid supply pipe has a first plurality of openings along a length of the liquid supply pipe along the bottom portion of the bath. A gas supply pipe runs along the bottom portion of the bath. The gas supply pipe has a second plurality of openings along a length of the gas supply pipe along the bottom portion of the bath. The liquid supply pipe introduces a second liquid into the first liquid via the first plurality of openings and the gas supply pipe introduces a gas into the first liquid via the second plurality of openings.

Dependencies are inferred from the claim text.