Substrate processing apparatus, substrate processing method and computer-readable recording medium

A substrate processing apparatus, comprising:

• a film forming part configured to form a metal-containing film on a front surface of a substrate;
• a film cleaning part configured to clean the metal-containing film formed on a peripheral edge portion of the substrate;
• and
• a controller,
• wherein the controller is configured to execute:
• controlling the film forming part so as to form the metal-containing film on the front surface of the substrate;
• controlling the film cleaning part so as to supply a first chemical liquid having a function of dissolving the metal-containing film to a first position in the peripheral edge portion of the substrate;
• and
• controlling the film cleaning part so as to supply a second chemical liquid having a function of dissolving the metal-containing film to a second position in the peripheral edge portion of the substrate after the metal-containing film dissolved by the first chemical liquid is dried, the second position being closer to a periphery of the substrate than the first position.