Semiconductor manufacturing apparatus

A semiconductor manufacturing apparatus, comprising:

• an air distributor inside a chamber, wherein the air distributor includes:
• a first annular plate and a second annular plate disposed in an interior volume of the chamber, wherein an inner surface of the first annular plate and an inner surface of the second annular plate are connected to each other;
• a hollow region defined by the first annular plate and the second annular plate;
• at least one gas through hole extended from an outer surface of the first annular plate to the inner surface of the first annular plate;
• and
• a plurality of ditches between the inner surface of the first annular plate and the inner surface of the second annular plate, wherein the ditches are connected with the at least one gas through hole and extended from the at least one gas through hole to the hollow region to blow gas toward the hollow region.

A semiconductor manufacturing apparatus, comprising:

• an air distributor inside a chamber, wherein the air distributor includes:
• a first annular plate and a second annular plate disposed in an interior volume of the chamber, wherein an inner surface of the first annular plate and an inner surface of the second annular plate are connected to each other;
• a hollow region defined by the first annular plate and the second annular plate;
• at least one first gas through hole and at least one second gas through hole extended from an outer surface of the first annular plate to the inner surface of the first annular plate;
• and
• a plurality of first ditches and second ditches between the inner surface of the first annular plate and the inner surface of the second annular plate, wherein the first ditches are connected with the at least one first gas through hole and extended from the at least one first gas through hole to the hollow region to blow gas toward the hollow region, and the second ditches are connected with the at least one second gas through hole and extended from the at least one second gas through hole to the hollow region to such gas from the hollow region.