Polarized light irradiation apparatus and photosensitive film-coated substrate manufacturing method

A polarized light irradiation apparatus for exposure of a photosensitive film on a substrate, the polarized light irradiation apparatus comprising:

• a transport stage including a stage surface configured to move in a state where the substrate is placed on the stage surface and a heating mechanism configured to heat the substrate placed on the stage surface;
• and
• a first polarized light irradiation mechanism and a second polarized light irradiation mechanism configured to irradiate the stage surface moving in an exposure region with polarized light,
• the transport stage moving in the exposure region of the first polarized light irradiation mechanism at a first average speed while heating the substrate by the heating mechanism, and then moving in the exposure region of the second polarized light irradiation mechanism at a second average speed lower than the first average speed while heating the substrate by the heating mechanism.