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US 2019/0169746 A1Published application
Gas mixing device and method, and cvd apparatus including the same
AssigneeBoe Technology Group Co., Ltd.
InventorFengjuan LIU
Life of this patent
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Abstract
The present disclosure relates to a gas mixing device and a method, and a CVD apparatus including the gas mixing device. The gas mixing device includes: an inlet; a mixing tube in communication with the inlet, an inner wall of the mixing tube being formed with a spiral structure such that gases entering the mixing tube are rotatably travelling along the spiral structure and mixed; and an outlet through which the mixed gases in the mixing tube outflow.
Claims20
A gas mixing device, comprising:
- an inlet;
- a mixing tube in communication with the inlet, an inner wall of the mixing tube being formed with a spiral structure such that gases entering the mixing tube rotatably travel along the spiral structure and are mixed;
- and
- an outlet through which the mixed gases in the mixing tube outflow.
1 more element
A method for mixing gases, comprising:
- mixing a plurality of gases in a mixing tube, the mixing tube having a first diameter and an inner wall with a spiral structure, to be outputted for chemical vapor deposition.
Dependencies are inferred from the claim text.