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US 2019/0056675 A1Published application
Apparatus and method for using scanning light beam for film or surface modification
AssigneeLithoptek LLC
InventorsMark Schattenburg, Rudolf Hendel, John Glenn
Life of this patent
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Abstract
A method and apparatus for treating a substrate and, in particular, making secondary adjustments to the results of a primary process applied to the substrate, leading to improved uniformity of the overall process, in which a substrate is positioned on a substrate holder; a scanning a beam of light is directed onto the surface of the substrate; and the amplitude of the scanned beam is varied by location based on a substrate signature.
Claims14
A method of treating a substrate comprising:
- positioning the substrate on a substrate holder;
- scanning a beam of light onto a surface of the substrate;
- varying an amplitude of said light beam by location based on a substrate signature.
A method of treating a substrate comprising:
- positioning the substrate on a substrate holder;
- loading a substrate signature correction map into memory;
- varying an amplitude of a light beam of light scanned onto the surface of the substrate based the substrate signature correction map.
An apparatus for treating a substrate, comprising:
- a substrate;
- a laser capable of emitting a beam;
- a beam deflector;
- a beam power or energy control unit;
- a substrate signature correction map containing beam power or energy control information and beam position information for each position in the substrate;
- a controller, wherein the controller outputs the beam power or energy control information in the substrate signature correction map to the beam power or energy control unit and outputs the beam position information in the substrate signature correction map to the beam deflector.
3 more elements
Dependencies are inferred from the claim text.