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US 2019/0056652 A1Published application
Photomask having multi-layered transfer patterns
AssigneeSK hynix Inc.
InventorTaejoong HA
Life of this patent
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Abstract
A photomask includes a light transmission substrate and a phase shift pattern. The phase shift pattern includes a first phase shift pattern layer, a second phase shift pattern layer and a third phase shift pattern layer which are sequentially stacked on a surface of the light transmission substrate. A light transmittance of each of the first and third phase shift pattern layers is less than a light transmittance of the second phase shift pattern layer.
Claims14
A photomask comprising:
- a light transmission substrate;
- and
- a plurality of phase shift patterns, each phase shift pattern including a first phase shift pattern layer, a second phase shift pattern layer and a third phase shift pattern layer which are sequentially stacked on a surface of the light transmission substrate,
- wherein a light transmittance of each of the first and third phase shift pattern layers is less than a light transmittance of the second phase shift pattern layer.
1 more element
A photomask comprising:
- a substrate;
- a multi-layered reflection layer disposed on a surface of the substrate;
- and
- an absorption pattern including a first absorption pattern layer and a second absorption pattern layer which are sequentially stacked on a surface of the multi-layered reflection layer opposite to the substrate,
- wherein a light absorptiveness of the second absorption pattern layer is higher than a light absorptiveness of the first absorption pattern layer.
2 more elements
Dependencies are inferred from the claim text.