US 2018/0321592 A1Published application

A lithography apparatus, and a method of manufacturing a device

AssigneeASML Netherlands B.V.

InventorsNorbertus Josephus Martinus VAN DEN NIEUWELAAR, Victor Manuel BLANCO CARBALLO, Thomas Augustus MATTAAR, Johannes Cornelis Paulus MELMAN, Gerben PIETERSE, Johannes Theodorus Guillielmus Maria VAN DE VEN, Jan-Piet VAN DE VEN, Petrus Franciscus VAN GILS

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Abstract

A route for a substrate support that supports a substrate in an immersion lithographic apparatus is calculated to satisfy the following constraints: after the edge of the substrate first contacts the immersion space, the substrate remains in contact with the immersion space until all target portions are exposed; exposures of target portions are performed while the substrate moves in a scan direction; and all movements of the substrate between exposures are, in a plane parallel to its upper surface, either curved or only in one of the scan directions or transverse directions. In order to reduce exposure defects at the edge of the substrate the outside portion of the substrate is avoided from being exposed to the immersion liquid. The transfer routes are designed to overly the substrate surface.

Claims20

Dependent claims

A lithographic apparatus comprising:

a projection system configured to project a patterned beam and having a final optical element;
a substrate support configured to support a substrate in the patterned beam;
a liquid confinement structure configured to at least partly confine a liquid to an immersion space between the final optical element and the substrate;
a positioning device configured to position the substrate support and thereby the substrate;
and
a controller configured to control the positioning device so that the substrate support follows a route comprising:
a first exposure motion during which the substrate is moved at an essentially constant speed in a first direction;
a transfer motion performed after the end of the first exposure motion;
and
a next second exposure motion during which the substrate is moved at an essentially constant speed in a direction parallel to the first direction,
wherein the transfer motion comprises:
a first transit motion during which the substrate is accelerated in a second direction orthogonal to the first direction and decelerated in the first direction;
and subsequently
a second transit motion during which the substrate's motions in a plane containing the first and second directions are only in the second direction;
and subsequently
a third transit motion during which the substrate accelerates in the first direction and decelerates in the second direction;
and subsequently
a fourth transit motion in which the substrate's movements in the plane containing the first and second directions are only parallel to the first direction.

15 more elements

A method of manufacturing a device using a lithographic apparatus, the method comprising:

using a projection system of a lithographic apparatus to project a patterned beam and having a final optical element;
using a substrate support to support a substrate in a path of the patterned beam;
using a liquid confinement structure to at least partly confine a liquid to an immersion space between the final optical element and the substrate;
and
using a positioning device to position the substrate support and thereby the substrate, the positioning of the substrate support comprising:
performing a first exposure motion during which the substrate is moved at an essentially constant speed in a first direction;
performing a transfer motion after the end of the first exposure motion;
and
performing a next second exposure motion during which the substrate is moved at an essentially constant speed in a direction parallel to the first direction,
wherein the transfer motion comprises:
a first transit motion during which the substrate is accelerated in a second direction orthogonal to the first direction and decelerated in the first direction;
a second transit motion during which the substrate's movements in a plane containing the first and second directions are only in the second direction;
a third transit motion during which the substrate accelerates in the first direction and decelerates in the second direction;
a fourth transit motion in which the substrate's movements in the plane containing the first and second directions are only parallel to the first direction.

11 more elements

A lithographic apparatus comprising:

a projection system configured to project a patterned beam and having a final optical element;
a substrate support configured to support a substrate in the patterned beam;
a liquid confinement structure configured to at least partly confine a liquid to an immersion space between the final optical element and the substrate;
a positioning device configured to position the substrate support and thereby the substrate;
and
a controller configured to control the positioning device so that the substrate support follows a route comprising:
a first exposure motion during which the substrate is moved at an essentially constant speed in a first direction;
a transfer motion performed after the end of the first exposure motion, and
a next second exposure motion during which the substrate is moved at an essentially constant speed in a direction opposite to the first direction,
wherein the transfer motion comprises:
a first transit motion during which the substrate is accelerated in a second direction orthogonal to the first direction and decelerated in the first direction;
and subsequently
a second transit motion during which the substrate's motions in a plane containing the first and second directions are only in the second direction;
and subsequently
a third transit motion during which the substrate accelerates in the first direction and decelerates in the second direction;
and subsequently
a fourth transit motion in which the substrate's movements in the plane containing the first and second directions are only parallel to the first direction.

14 more elements

Dependencies are inferred from the claim text.