Liquid jet and recovery system for immersion lithography

An immersion lithography apparatus comprising:

• a projection system having a last optical element;
• a plurality of liquid supply openings arranged to surround a path of exposure light that exits from an end surface of the last optical element, the plurality of liquid supply openings facing downwardly;
• and
• a plurality of liquid recovery openings arranged to surround the path of the exposure light and arranged radially outward of the plurality of liquid supply openings with respect to the path of the exposure light, the plurality of liquid recovery openings facing downwardly,
• wherein:
• an upper surface of a substrate is opposite to the plurality of liquid supply openings and the plurality of liquid recovery openings,
• a portion of the upper surface of the substrate is covered with immersion liquid,
• the immersion liquid flows across the end surface of the last optical element, and
• the substrate is exposed with the exposure light through the immersion liquid between the end surface of the last optical element and the upper surface the substrate.