Exposure apparatus and device fabricating method

A liquid immersion exposure apparatus comprising:

• a projection system having an final optical element, via which exposure light is projected;
• first and second stages each of which is movable below the projection optical system, the first stage having a holding portion configured to hold a substrate, the first and second stages being movable close toward and away from each other;
• and
• a nozzle member having an opening through which the exposure light is projected, the nozzle member having a supply opening via which a liquid is supplied, the nozzle member having a first recovery opening via which the liquid is collected,
• wherein:
• during exposure of the substrate, a portion of a surface of the substrate is covered by the liquid while performing liquid supply from the supply opening and liquid collection from the first recovery opening,
• the first and second stages are controlled for mutual cooperation between a first situation and a second situation, where the liquid is confined between one of the first and second stages and the projection system in the first situation, the liquid is confined between the other of the first and second stages and the projection system in the second situation, and the liquid is confined under the projection system between the first situation and the second situation, and
• for the mutual cooperation, the first and second stages are moved such that a first edge of an upper surface of a protruding portion of the first stage and a second edge of an upper surface of the second stage come close to each other, and the close first and second stages are moved such that the liquid under the projection system crosses over a gap between the first edge and the second edge.