Substrate treating device and substrate treating method

A substrate treating device comprising:

• a spinning holding mechanism for holding a substrate;
• a treatment liquid supply nozzle for supplying a treatment liquid to the substrate;
• a shielding plate that is arranged opposite to the substrate held by the spinning holding mechanism and that moves in a contact/separate direction with respect to the substrate;
• a shielding plate rotating mechanism for rotating the shielding plate;
• and
• a rear surface nozzle head for respectively supplying the treatment liquid and a gas to a rear surface of the substrate;
• and
• a control device,
• wherein the control device:
• controls, for every first number of sheets that is preset, the shielding plate rotating mechanism to locate the shielding plate at a standby position when the treatment liquid is not supplied and to rotate the shielding plate without moving the shielding plate from the standby position when the treatment liquid is supplied from the treatment liquid supply nozzle,
• controls, for every second number of sheets that is preset, the rear surface nozzle head to respectively supply the treatment liquid and the gas to the shielding plate after the substrate is carried out from a treatment chamber, and
• controls, for every third number of sheets that is preset, the treatment liquid supply nozzle to supply the treatment liquid to a periphery of the shielding plate after the substrate is carried out from the treatment chamber.

A substrate treating method for rotating and washing a substrate, the method comprising:

• a substrate holding step of holding the substrate;
• a treatment liquid supply step of supplying a treatment liquid to the substrate from a treatment liquid supply nozzle;
• a shielding plate moving step of moving a shielding plate in a contact/separate direction with respect to the substrate, the shielding plate being arranged facing the substrate held in the substrate holding step;
• and
• a shielding plate rotating step of locating the shielding plate at a standby position when the treatment liquid is not supplied and rotating the shielding plate without moving the shielding plate from the standby position during the supply of the treatment liquid by the treatment liquid supply nozzle.