Lithographic apparatus and device manufacturing method

A lithographic apparatus comprising:

• a projection system configured to project a patterned radiation beam onto a target portion of a substrate, the projection system having a final element;
• a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid, the barrier member being spaced from the final element to define a gap therebetween;
• a deformable protrusion extending into the gap between an outer surface of the final element and an outer surface of the barrier member;
• and
• a liquidphobic surface on the barrier member and/or the final element along at least part of a path, in the gap, between the protrusion and the reservoir.

A device manufacturing method comprising:

• projecting a patterned beam of radiation from a projection system through an immersion liquid onto a target portion of a substrate;
• confining the immersion liquid in a space between the projection system and the substrate using a final element of the projection system and a barrier member surrounding the space;
• and
• limiting movement of fluid using a deformable protrusion extending into a gap between an outer surface of the final element and an outer surface of the barrier member, wherein there is a liquidphobic surface on the barrier member and/or the final element along at least part of, a path, in the gap, between the protrusion and the space containing the liquid.

A lithographic apparatus comprising:

• a projection system configured to project a patterned radiation beam onto a target portion of a substrate, the projection system having a final element;
• a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid, the barrier member being spaced from the final element to define a gap therebetween;
• a protrusion extending into the gap between an outer surface of the final element and an outer surface of the barrier member;
• a liquidphobic surface on the barrier member and/or the final element along at least part of a path, in the gap, between the protrusion and the reservoir;
• and
• a liquidphobic surface on the barrier member and/or the final element along at least part of a path, in the gap, outward from the protrusion relative to the reservoir.