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US 2017/0285487 A1Published application
Lithographic apparatus and a method of operating the apparatus
AssigneeASML Netherlands B.V.
InventorsIvo Adam Johannes THOMAS, Siebe LANDHEER, Arnout Johannes MEESTER, Marcio Alexandre Cano MIRANDA, Gheorghe TANASA
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Abstract
A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.
Claims16
A lithographic apparatus comprising:
- a projection system;
- a liquid confinement structure configured at least partly to confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table;
- and
- a member adjacent an optically active part of a final element of the projection system, wherein, in normal use, the member is between immersion liquid and the optically active part.
1 more element
Dependencies are inferred from the claim text.