Curing substrate pretreatment compositions in nanoimprint lithography

A nanoimprint lithography method comprising:

• disposing a pretreatment composition on a nanoimprint lithography substrate to form a pretreatment coating on the nanoimprint lithography substrate, wherein the pretreatment composition comprises a polymerizable component;
• disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the nanoimprint lithography substrate, wherein the imprint resist is a polymerizable composition and comprises a polymerization initiator;
• forming a composite polymerizable coating on the nanoimprint lithography substrate as each discrete portion of the imprint resist spreads beyond its target area, wherein the composite polymerizable coating comprises a mixture of the pretreatment composition and the imprint resist;
• contacting the composite polymerizable coating with a nanoimprint lithography template;
• activating the polymerization initiator;
• polymerizing the composite polymerizable coating to yield a composite polymeric layer and an uncured portion of the pretreatment coating on the nanoimprint lithography substrate;
• and
• after polymerizing the composite polymerizable coating to yield the composite polymeric layer, polymerizing the uncured portion of the pretreatment coating.