Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold
AssigneeCanon Kabushiki Kaisha
InventorToshiki Ito
Life of this patent
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AssigneeCanon Kabushiki Kaisha
InventorToshiki Ito
Estimating the term…
A pattern is formed on a substrate with a layer of a curable composition (A1) containing a component (a1) serving as a polymerizable compound on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing at least a component (a2) serving as a polymerizable compound dropwise discretely onto the layer of the curable composition (A1), subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold having a pattern and the substrate, then irradiating the mixture layer with light to cure the layer, and releasing the mold from the mixture layer after the curing, a contact angle of a composition of components of the curable composition (A1) except a solvent of the curable composition (A1) with respect to a surface of the mold being 10° or less.
A pattern forming method, comprising in the following order:
An imprint pretreatment coating material consisting of a curable composition (A1) which forms a liquid film as pretreatment coating on a substrate and promotes spreading of components of liquid droplets in the plane of the substrate when the liquid droplets are dispensed onto the liquid film, wherein
Dependencies are inferred from the claim text.