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US 2017/0255111 A1Published application
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsHelmar VAN SANTEN, Aleksey KOLESNYCHENKO
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Abstract
A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.
Claims21
-19. (canceled)
A lithographic apparatus comprising:
- a projection system configured to project a patterned beam onto a target portion of a substrate;
- a barrier member located adjacent the projection system and surrounding a path of the radiation beam through the space, the barrier member comprising a liquid inlet port configured to supply a liquid to a space between the substrate and the projection system;
- and
- a substrate table configured to hold the substrate, the substrate table being movable relative to the liquid inlet port and the substrate table comprising:
- a recess configured to support the substrate therein;
- a first fluid opening located in the recess, the first fluid opening configured to drain at least part of the liquid;
- a sensor system component located at a top side of the substrate table and located horizontally outward of the first fluid opening;
- and
- a second fluid outlet opening, located horizontally outward of the first fluid outlet opening and of the recess, configured to drain at least part of the liquid.
6 more elements
A lithographic apparatus comprising:
- a projection system configured to project a beam of radiation onto a radiation- sensitive portion of a substrate;
- a barrier member located adjacent the projection system and surrounding a path of the radiation beam through the space, the barrier member configured to at least partly constrain a liquid in a space between the substrate and the projection system;
- and
- a substrate table configured to hold the substrate, the substrate table being movable relative to the barrier member and the substrate table comprising:
- a recess configured to hold the substrate, the recess configured such that a trough is formed between a peripheral edge of the recess and an outer peripheral edge of the substrate when the substrate is positioned in the recess, and
- a fluid outlet opening arranged to be located at a position horizontally outward from the recess, the fluid outlet opening configured to drain at least part of the liquid,
- wherein a horizontal cross-section of a top opening of the trough is essentially co-planar with a horizontal cross-section of the fluid outlet opening.
4 more elements
A lithographic apparatus comprising:
- a substrate table configured to hold a substrate;
- a projection system configured to project a patterned beam onto a target portion of the substrate;
- a liquid supply system configured to provide an immersion liquid to a space between the substrate and the projection system, the liquid supply system comprising a barrier member extending along at least a part of the boundary of the space and being moveable relative to the substrate table in a z axis of the apparatus or another axis perpendicular to the z axis;
- and
- an outlet positioned outward of and external to the barrier member at a time of supply of liquid by the liquid supply system, the outlet provided:
- above the substrate table, at an edge of the substrate table, or both.
3 more elements
Dependencies are inferred from the claim text.