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US 2016/0238926 A1Published application
Photomask blanks, photomasks fabricated using the same, and methods of fabricating photomask using the same
AssigneeSK hynix Inc.
InventorsEui Sang PARK, Kung Hoon NAM
Life of this patent
Estimating the term…
Abstract
Photomask blanks are provided. One of the photomask blanks includes a light transmission substrate, a light blocking layer disposed on a top surface of the light transmission substrate, and a heat radiation layer disposed on sidewalls and a bottom surface of the light transmission substrate. Related photomasks and fabrication methods of the photomasks are also provided.
Claims20
A photomask blank comprising:
- a light transmission substrate;
- a light blocking layer disposed on a top surface of the light transmission substrate;
- and
- a heat radiation layer disposed on sidewalls and a bottom surface of the light transmission substrate.
1 more element
A photomask blank comprising:
- a light transmission substrate;
- a phase shift layer disposed on a top surface of the light transmission substrate;
- a light blocking layer disposed on the phase shift layer;
- and
- a heat radiation layer disposed on sidewalls and a bottom surface of the light transmission substrate.
2 more elements
A photomask blank comprising:
- a light transmission substrate;
- a light blocking layer disposed on a top surface of the light transmission substrate;
- and
- a high strength support layer disposed on sidewalls and a bottom surface of the light transmission substrate.
1 more element
Dependencies are inferred from the claim text.