Substrate processing apparatus and non-transitory computer readable recording medium

A substrate processing apparatus comprising:

• a process chamber;
• a substrate support table disposed in the process chamber, the substrate support table including circumferentially arranged substrate placement units;
• a rotation unit configured to rotate the substrate support table;
• a plurality of source gas supply structures circumferentially arranged above the substrate support table;
• a source gas supply unit configured to supply a source gas to a region below the plurality of source gas supply structures via the plurality of source gas supply structures, the source gas supply unit comprising a source gas supply pipe connected to the plurality of source gas supply structures;
• a plurality of source gas exhaust structures configured to exhaust an atmosphere of the region below the plurality of source gas supply structures, wherein each source gas exhaust structure corresponds to each source gas supply structure;
• a plurality of source gas exhaust pipes connected to the plurality of source gas exhaust structures, wherein each source gas exhaust pipe is connected to each source gas exhaust structure;
• a source gas exhaust unit configured to exhaust an atmosphere of the process chamber via the plurality of source gas exhaust structures;
• a plurality of reactive gas supply structures disposed above the substrate support table, wherein each the plurality of reactive gas supply structures and each of the plurality of source gas supply structures are alternately arranged;
• a reactive gas supply unit configured to supply a reactive gas to a region below the plurality of reactive gas supply structures via the plurality of reactive gas supply structures;
• a plurality of reactive gas exhaust structures configured to exhaust an atmosphere of the region below the plurality of reactive gas supply structures, wherein each reactive gas exhaust structure corresponds to each reactive gas supply structure;
• a plurality of reactive gas exhaust pipes connected to the plurality of reactive gas exhaust structures, wherein each reactive gas exhaust pipe is connected to each reactive gas exhaust structure;
• a reactive gas exhaust unit configured to exhaust the atmosphere of the process chamber via the plurality of reactive gas exhaust structures;
• a plurality of reactive gas pressure detectors installed at the plurality of reactive gas exhaust pipes and configured to detect a pressure of the reactive gas;
• a storage unit configured to store a reactive gas pressure value representing the pressure of the reactive gas in a normal state and a reactive gas pressure value representing the pressure of the reactive gas in an abnormal state;
• and
• a controller configured to control at least the source gas supply unit, the source gas exhaust unit, the reactive gas supply unit, the reactive gas exhaust unit and the plurality of reactive gas pressure detectors and configured to compare the pressure of the reactive gas detected by the plurality of reactive gas pressure detectors to the reactive gas pressure value stored in the storage unit.