Sputtering device and maintenance method for sputtering device

A maintenance method for a sputtering device, comprising the steps of:

• moving a cathode carriage to take a plurality of targets and a plurality of cathodes supported by the cathode carriage out of a vacuum chamber;
• operating a plurality of cathode rotating apparatuses to rotate the plurality of targets and the plurality of cathodes so as to cause the targets to face upwards:
• operating a plurality of cathode sliding apparatuses to move the targets and the cathodes located in places at high height to places at low height;
• removing the targets from the cathodes to attach a plurality of new targets that are different from the targets to the cathodes;
• operating the plurality of cathode sliding apparatuses to move the plurality of new targets and the cathodes to return to an original height thereof;
• operating the plurality of cathode rotating apparatuses to rotate the new targets and the cathodes so as to return to original rotation angles;
• and
• moving the cathode carriage in an opposite direction to put the new targets and the cathodes supported on the cathode carriage back into the vacuum chamber.