Methods of Forming Pattern by Using Dual Tone Development Processes

A method of forming a pattern, the method comprising:

• forming a dual tone photoresist layer on a support layer;
• forming a low light exposure region, a middle light exposure region and a high light exposure region in a first region of the dual tone photoresist layer and forming a low light exposure region and a middle light exposure region in a second region of the dual tone photoresist layer by exposing the dual tone photoresist layer to light by using a mask in which a plurality of mask patterns that are spaced apart from one another in the first mask region and the second mask region and a gray feature that is formed in the second mask region are arranged, the first region corresponding to a first mask region and the second region corresponding to a second mask region;
• forming a plurality of preliminary patterns in the first region by removing the dual tone photoresist layer in the high light exposure region of the first region by performing a positive development process;
• and
• forming a plurality of first patterns which are spaced apart from one another in the middle light exposure region of the first region and a plurality of second patterns which are spaced apart from one another in the middle light exposure region of the second region by removing the double tone photoresist layer in the low light exposure region of the plurality of preliminary patterns of the first region and the double tone photoresist layer in the low light exposure region of the second region by performing a negative development process.

A method of forming a pattern, the method comprising:

• forming a dual tone photoresist layer on a support layer;
• exposing the dual tone photoresist layer to light by using a mask comprising a gray feature;
• removing the dual tone photoresist layer in a first portion of a first region by performing a positive development process;
• and
• removing the dual tone photoresist layer in a second portion of the first region and removing the dual tone photoresist layer in a first portion of a second region by performing a negative development process.