Position sensitive substrate device

A mask for a substrate support surface, the mask comprising:

• a second coarse position unit that is a counterpart to a first coarse position unit of a substrate device;
• and
• a second fine position unit that is a counterpart to a first fine position unit of the substrate device,
• wherein the second coarse position unit comprises at least one coarse target, and
• wherein the second fine position unit comprises at least one fine target.

A system comprising:

• a) a substrate device;
• b) a substrate support surface;
• and
• c) a substrate handler configured to position the substrate device on the substrate support surface,
• wherein the substrate device comprises:
• i) a first coarse position unit, and
• ii) a first fine position unit,
• wherein the substrate support surface comprises:
• i) a second coarse position unit that is a counterpart to the first coarse position unit, and
• ii) a second fine position unit that is a counterpart to the first fine position unit,
• wherein the system is configured to measure coarse positional offsets between the first and second coarse position units, re-position the substrate device on the substrate support surface based on the coarse positional offsets, and subsequently measure fine positional offsets between the first and second fine position units.