Liquid processing apparatus, liquid processing method, and storage medium

A liquid processing apparatus comprising:

• a substrate holding unit configured to hold a substrate horizontally;
• a rotating mechanism configured to rotate the substrate holding unit around a vertical axis;
• a main nozzle configured to eject a processing liquid onto a surface of the substrate held in the substrate holding unit;
• a nozzle moving mechanism configured to reciprocate the main nozzle between a first position where the processing liquid ejected from the main nozzle reaches a center of the substrate and a second position closer to a peripheral side of the substrate than the first position, and move the main nozzle between an ejection position above the substrate and a standby position;
• and
• a sub nozzle configured to eject the processing liquid to a third position closer to a peripheral side of the substrate than the first position,
• wherein a flow rate of the processing liquid ejected from the sub nozzle is set to be higher than a flow rate of the processing liquid ejected from the main nozzle.