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US 2015/0086927 A1Published application
Photoresist composition
AssigneeSumitomo Chemical Company, Limited
InventorsMasako SUGIHARA, Maki KAWAMURA, Maiko GODA
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Abstract
A photoresist composition comprising: a resin which has an acid-labile group; an acid generator; a compound which has a sulfide bond and a mercapto group; and a solvent.
Claims7
A photoresist composition comprising:
- a resin which has an acid-labile group;
- an acid generator;
- a compound which has a sulfide bond and a mercapto group;
- and a solvent.
1 more element
Dependencies are inferred from the claim text.