X-ray mask structure and method for preparing the same
AssigneeNational Synchrotron Radiation Research Center
InventorBor Yuan SHEW
Life of this patent
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Abstract
An X-ray mask structure includes a unibody support substrate having at least one thinned portion surrounded by a wall portion, a top layer disposed on the at least one thinned portion of the support substrate, and a plurality of X-ray absorber patterns disposed on the top layer over the at least one thinned portion. The top layer and the at least one thinned portion form a laminated membrane, wherein the at least one thinned portion and the wall portion provide mechanical support for the top layer, and the laminated membrane provides mechanical support for the plurality of X-ray absorber patterns.
Claims27
A method for preparing an X-ray mask structure, comprising:
- providing a support substrate having a top surface and a bottom surface;
- forming a top layer on the top surface and a bottom layer having an aperture on the bottom surface;
- removing a portion of the support substrate exposed by the aperture of the bottom layer to form at lease one thinned portion of the support substrate;
- and
- forming a plurality of X-ray absorber patterns on the top layer over the at lease one thinned portion.
An X-ray mask structure, comprising:
- a unibody support substrate having at least one thinned portion surrounded by a wall portion;
- a top layer disposed on the at least one thinned portion of the support substrate, wherein the top layer and the at least one thinned portion form a laminated membrane;
- and
- a plurality of X-ray absorber patterns disposed on the top layer over the at least one thinned portion;
- wherein the at least one thinned portion and the wall portion provide mechanical support for the top layer, and the laminated membrane provides mechanical support for the plurality of X-ray absorber patterns.
Dependencies are inferred from the claim text.