Chemical Fluid Processing Apparatus and Chemical Fluid Processing Method

A chemical fluid processing apparatus to treat a substrate with a plurality of chemical fluids such that substantially constant temperature is maintained across a substrate surface, the apparatus comprising:

• a substrate holding mechanism to hold the substrate;
• a rotating mechanism to rotate the substrate holding mechanism;
• a discharge nozzle above the substrate to supply a first chemical fluid at a first temperature to a front surface of the substrate;
• a first chemical fluid supply mechanism to supply the first chemical fluid to the discharge nozzle;
• a bar nozzle oriented in a radial direction of the substrate to supply a second chemical fluid at a second temperature to the front surface or a back surface of the substrate, the second temperature being higher than the first temperature;
• and
• a second chemical fluid supply mechanism to supply the second chemical fluid to the bar nozzle,
• wherein the bar nozzle comprises a plurality of outlets for discharging the second chemical fluid to a plurality of contacting places on the front surface or the back surface of the substrate at different distances from the center of the substrate.