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US 2015/0031210 A1Published application
Methods of fabricating fine patterns
AssigneeSK hynix Inc.
InventorsKeun Do BAN, Cheol Kyu BOK, Myoung Soo KIM, Ki Lyoung LEE, Hyun Kyung SHIM
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Abstract
Methods of forming fine patterns are provided. The method includes reinforcing a hydrophobic property of a hard mask layer using a surface treatment process to form a neutral layer, forming a block co-polymer layer on the neutral layer, and phase-separating the block co-polymer layer into first domains and second domains.
Claims20
A method of forming patterns, the method comprising:
- performing a surface treatment process to a hard mask layer to form a neutral layer with reinforcing a hydrophobic property of the hard mask layer;
- forming a block co-polymer layer over the neutral layer;
- and
- phase-separating the block co-polymer layer into first domains and second domains.
1 more element
A method of forming patterns, the method comprising:
- forming guide patterns over a hard mask layer;
- applying a surface treatment process to portions of the hard mask layer exposed by the guide patterns to form neutral portions with a reinforced hydrophobic property;
- forming a block co-polymer layer over the hard mask layer including the neutral portions;
- and
- phase-separating the block co-polymer layer into first domains and second domains.
2 more elements
A method of forming patterns, the method comprising:
- forming mask patterns over a hard mask layer;
- selectively removing portions of the hard mask layer exposed by the mask patterns to form hard mask patterns;
- applying a surface treatment process to the hard mask patterns to form neutral patterns with a reinforced hydrophobic property;
- forming a block co-polymer layer over the neutral patterns;
- and
- phase-separating the block co-polymer layer into first domains and second domains.
3 more elements
Dependencies are inferred from the claim text.