Liquid processing apparatus

A liquid processing apparatus for performing liquid processing with respect to a substrate using processing fluid, comprising:

• a plurality of substrate holding units arranged side by side in a left-right direction, each of the substrate holding units configured to horizontally hold the substrate;
• a nozzle provided in a corresponding relationship with each of the substrate holding units, the nozzle configured to supply the processing fluid to the substrate held in each of the substrate holding units;
• and
• a nozzle moving mechanism configured to move the nozzle forward and backward in a front-rear direction intersecting an arrangement direction of the substrate holding units between a supplying position in which the processing fluid is supplied to a region including a central portion of the substrate and a waiting position which is defined at a rear side of a row of the substrate holding units opposite to a front side of the row of the substrate holding units at which the substrate is loaded and unloaded.