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US 2014/0272705 A1Published application
Photoresist Application
AssigneeInfineon Technologies AG
InventorsThomas Walter, Andreas Behrendt
Life of this patent
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Abstract
Devices and methods are provided where photoresist is applied on a substrate and at least some regions of the photoresist are dried prior to removing a substrate from a substrate support.
Claims25
A device, comprising:
- a substrate support;
- a photoresist application device configured to apply photoresist on a substrate on the substrate support;
- and
- a drying device configured to dry at least some regions of the photoresist on the substrate while the substrate is on the substrate support.
1 more element
A device, comprising:
- a rotatable substrate support;
- a nozzle configured to apply photoresist on a substrate on the substrate support;
- and
- an infrared lamp configured to irradiate at least part of the substrate on the substrate support with infrared radiation.
1 more element
A method, comprising:
- placing a substrate on a substrate support;
- applying photoresist on the substrate while the substrate is on the substrate support;
- drying at least some regions of the photoresist while the photoresist is on the substrate;
- and
- removing the substrate from the substrate support.
2 more elements
A method for manufacturing a device, comprising:
- providing a substrate support;
- providing a photoresist application device configured to apply photoresist on a substrate on the substrate support;
- and
- providing a drying device configured to dry at least some regions of the photoresist on the substrate while the substrate is on the substrate support.
1 more element
Dependencies are inferred from the claim text.