Mask for Extreme Ultraviolet Lithography and Method of Fabricating Same

A mask comprising:

• a substrate having two regions, a mask border region and a mask image region;
• the mask image region including a first reflective surface disposed over the substrate, the first reflective surface being substantially in a first plane;
• and
• the mask border region including a second reflective surface disposed over the substrate, the second reflective surface being substantially non-parallel with the first plane

A method comprising:

• providing a patterned mask having a mask image region and a mask border region;
• providing a mask border frame having a first surface and a second surface, wherein the first surface is substantially not parallel to the second surface;
• and
• mounting the second surface of the mask border frame to the mask border region of the patterned mask.