Back to results
US 2014/0272674 A1Published application
Mask structure
AssigneeNanya Technology Corporation
InventorsYu-Mei Ni, Chun-Yen Huang, Pei-Cheng Fan
Life of this patent
Estimating the term…
Abstract
A mask structure, including a substrate; an absorber layer formed on the substrate; and a patterned reflection layer formed on the absorber layer. Optionally, the mask structure may further include a buffer layer, a conductive coating, or combinations thereof. The buffer layer may be formed between the absorber layer and the reflection layer, and the conductive coating may be formed at a back side of the substrate.
Claims9
A mask structure, comprising:
- a substrate;
- an absorber layer formed on the substrate;
- and
- a patterned reflection layer formed on the absorber layer.
1 more element
Dependencies are inferred from the claim text.