Tungsten diazabutadiene precursors, their synthesis, and their use for tungsten containing film depositions

Abstract

Disclosed are tungsten diazabutadiene molecules, their method of manufacture, and their use in the deposition of tungsten-containing films. The disclosed molecules have the formula W(DAD)3, wherein DAD is a 1,4-diazabuta-1,3-diene Isgand N4 and its reduced derivatives. The DAD !igand is directly coordinated to tungsten through the N atoms. The disclosed molecules may be used to deposit tungsten, tungsten-nitride, tungsten-carbonitride, or tungsten oxide films, or any other tungsten-containing films. The tungsten-containing films may be deposited using the disclosed molecules in thermal and/or plasma-enhanced CVD. ALD, pulse CVD or any other type of depositions methods.

Dependencies are inferred from the claim text.