Imprint mold and method for making using sidewall spacer line doubling

A method for making an imprint mold having a planar substrate and imprinting features extending from the planar substrate, the method comprising:

• providing a planar substrate;
• depositing on the planar substrate an etch-resistant base layer;
• depositing on the base layer a diamond-like carbon (DLC) layer;
• patterning the DLC layer into a plurality of stripes on the base layer, the DLC stripes having tops and sidewalls;
• depositing, by atomic layer deposition, a titanium oxide spacer layer on the tops and sidewalls of the DLC stripes and on the base layer between the DLC stripes;
• etching away the spacer layer on the tops of the DLC stripes and on the base layer between the DLC stripes, leaving the DLC stripes and sidewall spacers;
• etching away the DLC stripes, leaving stripes of sidewall spacers on the base layer as the imprint mold features;
• and
• depositing a conformal film of silicon dioxide over the sidewall spacer stripes and the base layer between the sidewall spacer stripes.

An imprint mold comprising:

• a substrate having a planar surface;
• a base layer selected from Cr, Pd, Rh and alloys thereof on the substrate planar surface;
• a plurality of pillars of a material selected from a titanium oxide (TiOx), an aluminum oxide (AlOx), HfO2, a silicon oxide (SiOx), a silicon nitride (SiNx), Si, Mo and Ta, the pillars extending from the base layer and arranged into a pattern selected from generally radial spokes, generally concentric circular rings, and parallel generally straight lines;
• and
• a conformal film of silicon dioxide having a thickness greater than or equal to 0.5 nm and less than or equal to 5 nm on the tops and sidewalls of the pillars and on regions of the base layer between the pillars.