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US 2014/0231550 A1Published application
Gas distributor for a CVD reactor
AssigneeAixtron SE
InventorsThomas Krücken, Baskar Pagadala Gopi, Martin Dauelsberg
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AssigneeAixtron SE
InventorsThomas Krücken, Baskar Pagadala Gopi, Martin Dauelsberg
Estimating the term…
The invention relates to a gas distributor for a CVD reactor having at least two separate gas distribution chambers (10, 20), into each of which a process gas can be fed through an infeed opening (2, 3), a gas distribution device disposed in a top plane being in each case flow-connected to connecting channels (13, 23) disposed in a bottom plane, the connecting channels (13, 23) associated with different gas distribution chambers (10, 20) lying alternately adjacent to one another and having gas outlet openings (14, 24) for the process gases to escape. In order to improve the gas distribution device, it is proposed that each of the at least two gas distribution devices has a distribution section (12, 22), which in each case is flow-connected to a plurality of sub-distribution sections (11, 21), the connecting channels (13, 23) being in each case flow-connected to a plurality of sub-distribution sections (11, 21) at different points, the sub-distribution sections (11, 21) of different gas distribution chambers (10, 20) lying alternately adjacent to one another and being separated from one another by dividing walls (9).
A gas distributor for a CVD reactor having at least two separate gas distribution chambers (10, 20), into each of which a process gas can be fed through an infeed opening (2, 3), a gas distribution device disposed in a top plane being in each case flow-connected to connecting channels (13, 23) disposed in a bottom plane, the connecting channels (13, 23) associated with different gas distribution chambers (10, 20) lying alternately adjacent to one another and having gas outlet openings (14, 24) for the process gases to escape, characterized in that each of the at least two gas distribution devices has a distribution section (12, 22), which in each case is flow-connected to a plurality of sub-distribution sections (11, 21), the connecting channels (13, 23) being in each case flow-connected to a plurality of sub-distribution sections (11, 21) at different points, the sub-distribution sections (11, 21) of different gas distribution chambers (10, 20) lying alternately adjacent to one another and being separated from one another by dividing walls (9).
A gas-distributor for a CVD reactor having a gas outlet plate (8) which has gas outlet openings (14, 24) which emanate from connecting channels (13, 23) which are flow-connected to chamber sections (11, 21) of separate gas distribution chambers (10, 20), characterized in that the connecting channels (13, 23) are formed by substantially U-shaped tunnel elements (15, 25), the side walls (17, 27) of which are connected to the inner side (4) of the gas outlet plate (8) and are connected to one another with a connecting wall (18, 28).
Dependencies are inferred from the claim text.