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US 2014/0212793 A1Published application
Multiresolution Mask Writing
AssigneeMentor Graphics Corporation
InventorEmile Y. Sahouria
Life of this patent
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Abstract
Mask writing techniques that employ multiple masking writing passes. A first writing pass is made to write a first shot pattern having a first resolution. A second writing pass is then made to write a second shot pattern having a second resolution finer than the first resolution, such that the second shot pattern substantially overlaps with the first shot pattern on the mask substrate.
Claims1
A method of writing a target image onto a mask substrate, comprising:
- writing a first shot pattern onto a mask substrate, the first shot pattern having a first resolution;
- and
- writing a second shot pattern onto a mask substrate, the second shot pattern having a second resolution finer than the first resolution, such that the second shot pattern substantially overlaps with the first shot pattern.
Dependencies are inferred from the claim text.