Detecting apparatus, wafer and electronic device

Abstract

Provided is a detection apparatus that detects process variation in a plurality of comparators that each output a comparison result obtained by comparing a signal level of an input signal to a reference level, the detection apparatus comprising a signal input section that inputs the input signal and the reference level in common to the comparators, and sequentially changes the signal level of the input signal; and a detecting section that detects, for each signal level, a number of comparison results that indicate a predetermined result, from among the comparison results of the comparators, and detects the process variation based on a distribution of the number of comparison results that indicate the predetermined result.

Dependencies are inferred from the claim text.