US 2014/0194050 A1 · GAS PURIFIER FOR WAFER SUBSTRATE ACCOMMODATING UNIT

Abstract

A gas purifier to be applied on a wafer substrate accommodating unit with an inlet hole includes an outer tube and an inner tube. The outer tube is disposed on the wafer substrate accommodating unit and has a plurality of first gas filling apertures. One end of the inner tube is a closed end and the other end is an open end. The inner tube has a plurality of second gas filling apertures, and its open end is interconnected with the inlet hole. The inner tube is movably disposed within the outer tube between a first operating position and second operating position. The second gas filling apertures are correspondingly configured to an inner wall of the outer tube when the inner tube is at a first operating position, and interconnected with the first gas filling apertures when the inner tube is at a second operating position.

Claims10

Dependent claims

An gas purifier positioned in a wafer substrate accommodating unit including an inlet hole, comprising:

an outer tube disposed on the wafer substrate accommodating unit and having a plurality of first gas filling apertures;
and
an inner tube having a closed end, an open end, and a plurality of second gas filling apertures, wherein the open end is interconnected with the inlet hole;
wherein the inner tube is movably disposed in the outer tube between a first operating position and a second operating position, the second gas filling apertures are correspondingly configured to an inner wall of the outer tube when the inner tube is at the first operating position, and the second gas filling apertures are interconnected with the first gas filling apertures when the inner tube is at the second operating position.

1 more element

Dependencies are inferred from the claim text.

Gas purifier for wafer substrate accommodating unit

Life of this patent

Gas purifier for wafer substrate accommodating unit

Life of this patent

Abstract

Claims10