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US 2014/0154631 A1Published application
Method of removing negative acting photoresists
AssigneeRohm and Haas Electronic Materials LLC
InventorsPaul J. CICCOLO, Brian D. AMOS, Stephen McCAMMON
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Abstract
Polymerized negative acting photoresists are removed from substrates at relatively low temperatures and fast stripping times using aqueous based alkaline solutions.
Claims10
A method comprising:
- a) providing a substrate comprising polymerized negative acting photoresist;
- and
- b) contacting the substrate comprising the polymerized negative acting photoresist with an aqueous alkaline solution comprising ammonium hydroxide to remove the polymerized negative acting photoresist from the substrate.
Dependencies are inferred from the claim text.