Display substrate and method of measuring pattern dimensions of display substrate

A display substrate comprising:

• a base substrate that includes a plurality of pixel areas and at least one inspection area;
• a plurality of gate lines disposed on a the base substrate that extend in a first direction;
• a plurality of data lines insulated from the gate lines that extend in a second direction crossing the first direction;
• a plurality of pixels disposed in the pixel areas, respectively;
• and
• an inspection pattern disposed in at least one inspection area, wherein each of the pixels comprises:
• a thin film transistor connected to a corresponding gate line and a corresponding data line;
• and
• a pixel electrode connected to the thin film transistor and including at least one cut-away portion, wherein the inspection pattern comprises a plurality of diffraction grids extending in the first direction and spaced apart from each other in the second direction.

A method of measuring a pattern dimension of a display substrate, comprising:

• calculating an optical critical dimension of an inspection pattern of a display substrate from light reflected by the inspection pattern;
• and
• calculating a dimension of a pixel pattern disposed in each of a plurality of pixel areas in the display substrate from the optical critical dimension of the inspection pattern,
• wherein the inspection pattern comprises a plurality of diffraction grids extending in a first direction and spaced apart from each other in a second direction,
• wherein the optical critical dimension of the inspection pattern comprises at least one of the width in the second direction of the diffraction grids, a distance between adjacent diffraction grids, and a height of the diffraction grids.