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US 2013/0280427 A1Published application
Tube Reactor for Chemical Vapor Deposition
OwnerXuesong Li, Yu-Ming Lin +1inventors
InventorsXuesong Li, Yu-Ming Lin, Chun-Yung Sung
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Abstract
An apparatus for performing film deposition, comprises an energy source, a plurality of process tubes, and a gas manifold. The energy source is adapted to direct energy into a cylindrical space. The plurality of process tubes, in turn, pass through this cylindrical space. To perform the film deposition, the gas manifold is operative to introduce a respective gas flow into each of the plurality of process tubes.
Claims20
An apparatus for performing film deposition, the apparatus comprising:
- an energy source, the energy source adapted to direct energy into a cylindrical space;
- a plurality of process tubes, the plurality of process tubes passing through the cylindrical space;
- and
- a gas manifold, the gas manifold operative to introduce a respective gas flow into each of the plurality of process tubes.
1 more element
A method for performing film deposition, the method comprising the steps of:
- directing energy into a cylindrical space through which a plurality of process tubes pass;
- and
- introducing a respective gas flow into each of the plurality of process tubes.
Dependencies are inferred from the claim text.