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US 2013/0278908 A1Published application
Exposure apparatus and exposure method, maintenance method, and device manufacturing method
AssigneeNikon Corporation
InventorsYoshitomo NAGAHASHI, Katsushi NAKANO
Life of this patent
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Abstract
An exposure apparatus includes; a supply outlet that supplies a liquid to an optical path space of exposure light, and a liquid supply system that supplies an ionized ionic liquid to the supply outlet.
Claims20
An exposure apparatus that exposes a substrate via a projection optical system and liquid, comprising:
- a substrate stage configured to move below the projection optical system while holding the substrate;
- and
- a nozzle member having a first flow path through which a first liquid for exposure flows and a second flow path through which a second liquid different from the first liquid flows.
A method of controlling an exposure apparatus that exposes a substrate via a projection optical system and liquid, the method comprising:
- supplying a first liquid for exposure via a first flow path by using a nozzle member in which the first flow path is provided;
- and
- supplying a second liquid, which is different from the first liquid, via a second flow path in the nozzle member, the second flow path being different from the first flow path.
Dependencies are inferred from the claim text.