Exposure apparatus and method of manufacturing device
AssigneeCanon Kabushiki Kaisha
InventorRyousuke Fukuoka
Life of this patent
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Abstract
An exposure apparatus for projecting an image of a pattern on a substrate and for exposing the substrate is disclosed. The exposure apparatus includes a mask stage and a projection optical system. The mask stage holds plural masks so that the plural masks do not contact with each other, and the projection optical system includes plural optical systems. Each of the optical systems projects an image of a pattern of one mask among the plural masks onto an exposure area of the substrate. The apparatus exposes the substrate so that each exposure area of the substrate exposed by each optical system partly overlaps with each other.
Claims9
An exposure apparatus for projecting an image of a pattern onto a substrate and for exposing the substrate, the apparatus comprising:
- a mask stage configured to hold plural masks so that the plural masks do not contact with each other;
- and
- a projection optical system configured to project the image of the pattern on the substrate,
- wherein the projection optical system includes a plurality of optical systems,
- wherein each of the optical systems projects the image of the pattern of one mask among the plural masks onto an exposure area of the substrate, and
- wherein the apparatus exposes the substrate so that each exposure area of the substrate exposed by each optical system partly overlaps with each other.
A method of manufacturing a device, the method comprising:
- exposing a substrate using an exposure apparatus;
- and
- developing the exposed substrate,
- wherein the exposure apparatus projects an image of a pattern onto the substrate and exposes the substrate,
- wherein the exposure apparatus comprises:
- a mask stage configured to hold plural masks so that the plural masks do not contact with each other;
- and
- a projection optical system configured to project the image of the pattern on the substrate,
- wherein the projection optical system includes a plurality of optical systems,
- wherein each of the plurality of optical systems projects the image of the pattern of one mask among the plural masks on an exposure area of the substrate, and
- wherein the apparatus exposes the substrate so that each exposure area of the substrate exposed by each optical system partly overlaps with each other.
Dependencies are inferred from the claim text.