Exposure apparatus and exposure method
AssigneeShenzhen China Star Optoelectronics Technology Co., Ltd.
InventorsJehao Hsu, Minghung Shih, Jingfeng Xue
Life of this patent
Estimating the term…
Abstract
The present invention provides an exposure apparatus and an exposure method. The method comprises: utilizing an exposure light source to provide light rays to the photo-resist layer; and utilizing a reflective plate to reflect the light rays passing through the photo-resist layer and the transparent substrate back to the photo-resist layer. The present invention can reduce a line space of a pattern of the photo-resist layer.
Claims15
An exposure apparatus for exposing a photo-resist layer on a transparent substrate, wherein the exposure apparatus comprises:
- a mask disposed at one side of the photo-resist layer, wherein the mask includes at least one transparent opening, and a width of the transparent opening is less than 2 um;
- an exposure light source configured to provide light rays to the photo-resist layer, wherein the light rays provided by the exposure light source pass through the mask to reach the photo-resist layer;
- and
- a reflective plate disposed at an opposite side of the photo-resist layer for reflecting the light rays passing through the photo-resist layer and the transparent substrate back to the photo-resist layer, wherein the reflective plate is parallel to the photo-resist layer on the transparent substrate when exposing it.
An exposure apparatus for exposing a photo-resist layer on a transparent substrate, wherein the exposure apparatus comprises:
- a mask disposed at one side of the photo-resist layer;
- an exposure light source configured to provide light rays to the photo-resist layer, wherein the light rays provided by the exposure light source pass through the mask to reach the photo-resist layer;
- and
- a reflective plate disposed at an opposite side of the photo-resist layer for reflecting the light rays passing through the photo-resist layer and the transparent substrate back to the photo-resist layer.
An exposure method for exposing a photo-resist layer on a transparent substrate, wherein the exposure method comprises the following steps:
- utilizing an exposure light source to provide light rays to the photo-resist layer, wherein the light rays provided by the exposure light source pass through the mask to reach the photo-resist layer;
- and
- utilizing a reflective plate to reflect the light rays passing through the photo-resist layer and the transparent substrate back to the photo-resist layer.
Dependencies are inferred from the claim text.