Device manufacturing method and organic el device

A device manufacturing method comprising:

• a substrate preparation of preparing a substrate;
• a pixel electrode formation of forming, on the substrate, a plurality of pixel electrodes arranged at intervals;
• a photosensitive film formation of forming a photosensitive film by applying a photosensitive material onto the substrate;
• a first part exposure of, after an execution of the photosensitive film formation, arranging a first photomask to face the substrate and performing an exposure to cause a first part of the photosensitive film to be exposed to light via the first photomask;
• a second part exposure of, after or together with an execution of the first part exposure, arranging a second photomask to face the substrate and performing an exposure to cause a second part of the photosensitive film, which is different from the first part at least partially, to be exposed to light via the second photomask;
• and
• a development of developing the photosensitive film of which the first part and the second part have been exposed to light in the first part exposure and the second part exposure, respectively,
• a region in which the plurality of pixel electrodes are formed including a first pixel electrode formation region and a second pixel electrode formation region, and in the pixel electrode formation, the plurality of pixel electrodes being formed such that a gap between adjacent pixel electrodes in the second pixel electrode formation region is larger than a gap between adjacent pixel electrodes in the first pixel electrode formation region,
• in the second part exposure, the second photomask being arranged such that an end thereof overlaps with an end of the first photomask arranged in the first part exposure, and
• in the pixel electrode formation, the first part exposure and the second part exposure, an overlap between the first photomask and the second photomask positionally corresponding to the second pixel electrode formation region.

A device manufacturing method comprising:

• a substrate preparation of preparing a substrate;
• an electrode material film formation of forming, on the substrate, an electrode material film which contains an electrode material;
• a photosensitive film formation of forming a photosensitive film by applying a photosensitive material onto the electrode material film;
• a first part exposure of, after an execution of the photosensitive film formation, arranging a first photomask to face the substrate and performing an exposure to cause a first part of the photosensitive film to be exposed to light via the first photomask;
• a second part exposure of, after or together with an execution of the first part exposure, arranging a second photomask to face the substrate and performing an exposure to cause a second part of the photosensitive film, which is different from the first part at least partially, to be exposed to light via the second photomask;
• a development of developing the photosensitive film of which the first part and the second part have been exposed to light in the first part exposure and the second part exposure, respectively;
• and
• a pixel electrode formation of forming, on the substrate, a plurality of pixel electrodes arranged at intervals and forming one or more electrical wires each between adjacent pixel electrodes among the plurality of pixel electrodes by etching the electrode material film via the photosensitive film that has gone through a development performed in the development,
• in the second part exposure, the second photomask being arranged such that an end thereof overlaps with an end of the first photomask arranged in the first part exposure, and an overlap between the first photomask and the second photomask being arranged to be positioned above a region in which an electrical wire among the one or more electrical wires is to be formed.

A device manufacturing method comprising:

• a substrate preparation of preparing a substrate;
• an electrode material film formation of forming, on the substrate, an electrode material film which contains an electrode material;
• a photosensitive film formation of forming a photosensitive film by applying a photosensitive material onto the electrode material film;
• a first part exposure of, after an execution of the photosensitive film formation, arranging a first photomask to face the substrate and performing an exposure to cause a first part of the photosensitive film to be exposed to light via the first photomask;
• a second part exposure of, after or together with an execution of the first part exposure, arranging a second photomask to face the substrate and performing an exposure to cause a second part of the photosensitive film, which is different from the first part at least partially, to be exposed to light via the second photomask;
• a development of developing the photosensitive film of which the first part and the second part have been exposed to light in the first part exposure and the second part exposure, respectively;
• and
• a pixel electrode formation of forming, on the substrate, a plurality of pixel electrodes arranged at intervals by etching the electrode material film via the photosensitive film that has gone through a development performed in the development,
• a region in which the plurality of pixel electrodes are formed including a first pixel electrode formation region and a second pixel electrode formation region, and in the electrode material film formation through the pixel electrode formation, the plurality of pixel electrodes being formed such that a gap between adjacent pixel electrodes in the second pixel electrode formation region is larger than a gap between adjacent pixel electrodes in the first pixel electrode formation region,
• in the second part exposure, the second photomask being arranged such that an end thereof overlaps with an end of the first photomask arranged in the first part exposure, and an overlap between the first photomask and the second photomask being arranged to be positioned above the second pixel electrode formation region.

An organic EL device, comprising:

• a substrate;
• a plurality of pixel electrodes arranged at intervals on the substrate, each pixel electrode containing an electrode material;
• one or more electrical wires each of which is provided between adjacent pixel electrodes among the plurality of pixel electrodes on the substrate;
• one or more banks formed by causing a photosensitive material film to be exposed to light via a plurality of photomasks that are arranged such that adjacent photomasks overlap with each other partially, each of the one or more banks positioned to separate adjacent pixel electrodes and to separate a pixel electrode from an electrical wire, the one or more banks defining one or more sub-pixel regions and one or more electrical wire regions;
• a plurality of organic layers containing a luminescent organic material and being arranged in one-to-one correspondence with the plurality of pixel electrodes in the one or more sub-pixel regions;
• and
• a common electrode facing the plurality of pixel electrodes via the plurality of organic layers, and facing the one or more electrical wires,
• each surface, facing the common electrode, of the one or more electrical wires in the one or more electrical wire regions being larger in width than each overlap between adjacent photomasks.

An organic EL device, comprising:

• a substrate;
• a plurality of pixel electrodes arranged at intervals on the substrate;
• one or more electrical wires each of which is provided between adjacent pixel electrodes among the plurality of pixel electrodes on the substrate;
• one or more banks formed by causing a photosensitive material film to be exposed to light via a plurality of photomasks that are arranged such that adjacent photomasks overlap with each other partially, each of the one or more banks positioned to separate adjacent pixel electrodes and to separate a pixel electrode from an electrical wire, the one or more banks defining one or more sub-pixel regions and one or more electrical wire regions;
• a plurality of organic layers containing a luminescent organic material and being arranged in one-to-one correspondence with the plurality of pixel electrodes in the one or more sub-pixel regions;
• and
• a common electrode facing the plurality of pixel electrodes via the plurality of organic layers, and facing the one or more electrical wires,
• each surface of the one or more electrical wires functioning as an overlap between adjacent photomasks.

An organic EL device, comprising:

• a substrate;
• a plurality of pixel electrodes arranged at intervals on the substrate;
• one or more electrical wires each of which is provided between adjacent pixel electrodes among the plurality of pixel electrodes on the substrate;
• one or more banks formed by causing a photosensitive material film to be exposed to light via a plurality of photomasks that are arranged such that adjacent photomasks overlap with each other partially, each of the one or more banks positioned to separate adjacent pixel electrodes and to separate a pixel electrode from an electrical wire, the one or more banks defining one or more sub-pixel regions and one or more electrical wire regions;
• a plurality of organic layers containing a luminescent organic material and being arranged in one-to-one correspondence with the plurality of pixel electrodes in the one or more sub-pixel regions;
• and
• a common electrode facing the plurality of pixel electrodes via the plurality of organic layers, and facing the one or more electrical wires,
• the one or more electrical wire regions having a sign of exposures having been performed with use of the plurality of photomasks arranged such that adjacent photomasks overlap with each other partially.